Chemical vapor deposition (CVD) is a vacuum deposition method used to manufacture high quality, high-performance, solid materials. The process is frequently used in the semiconductor industry to produce thin films. Atomic layer deposition (ALD) is a thin-film deposition technique based on the consecutive use of a gas phase chemical process. The major part of ALD reactions use two chemicals called precursors. These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. Learn more about City Chemical LLC.
source https://www.citychemical.com/chemical-vapor-deposition.html
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