Hexachlorodisilane is an inorganic compound, a colorless liquid that fumes in moist air, which is produced in the chlorination of silicides. It has a chemical formula of Si2Cl6 and has specialty applications in as a reagent and as a volatile precursor to silicon metal. HCDS is used to grow thin films of Si, SiO2, SiC, Si3N4 by chemical vapor deposition. The advantage to using HCDS is that it can be used at low temperatures; powerful deoxygenating agent; reducing agent; fiber optics, solar energy products; aiding ALD process. It is mainly used in semiconductor and solar manufacturing industries. Hexachlorodisilane is also used to produce amorphous silicon thin films and can be utilized as a chemical diffusion barrier to create gate spacers for dynamic random access memory (DRAM) devices. Occasionally, it used in the pharmaceutical industry for the reduction of phosphine oxides. Learn more about City Chemical LLC.
source https://www.citychemical.com/hexachlorodisilane.html
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